Optical microlithography III
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Optical microlithography III technology for the next decade : March 14-15, 1984, Santa Clara, California

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Published by SPIE--the International Society for Optical Engineering in Bellingham, Wash., USA .
Written in English


  • Microlithography -- Congresses.,
  • Integrated circuits -- Very large scale integration -- Congresses.

Book details:

Edition Notes

Includes bibliographies and index.

Other titlesOptical microlithography 3., Optical microlithography three.
StatementHarry L. Stover, chairman/editor.
SeriesProceedings of SPIE--the International Society for Optical Engineering ;, v. 470
ContributionsStover, Harry L., Society of Photo-optical Instrumentation Engineers.
LC ClassificationsTR940 .O69 1984
The Physical Object
Paginationvi, 269 p. :
Number of Pages269
ID Numbers
Open LibraryOL2870263M
ISBN 100892525053
LC Control Number84050822

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  The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. It's more of a "theoretical lithography" book in the sense that various ideas that are expressed in words in other lithography books are mapped to their underlying mathematical optical, physical, and chemical models in this book. Because of this, this book is a prerequisite for doing computational lithography.5/5(7).   The completely revised Third Edition to the bestselling Microlithography: Science and Technologyprovides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale by: Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system-level view.

It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers. Introduction 3 Burn J. Lin, P. Rai-Choudhury. 1 Optical lithography 11 Harry J. Levinson, William H. Arnold. 2 Electron beam lithography Mark A. McCord, Michael J. Rooks. 3 X-ray lithography Franco Cerrina. 4 Deep-UV resist technology Robert D. Allen, Willard E. Conley, Roderick R. Kunz. The nm excimer laser for microlithography is designed as a tool for the production floor, and therefore maintenance must be established on a regularly scheduled basis. The primary maintenance steps for this type of laser are: Gas Exchange: Gas turnover is necessary to maintain a constant supply of fresh gas or a minimal level of fluorine atoms to support the energy demands of the laser.   This book changed my life. I was poor, living in a dumpster and ignorant about the principles of optical lithography - and then I found this book. Now, I have a successful career and am a much happier person. Whatever you do, wherever you go, buy this book!Reviews: 2.

“Welcome to The Lithography Tutor, a new regular feature of Microlithography World. As the name implies, the purpose of this column is to present lithography information in a tutorial format. Each issue of Microlithography World will carry a two to three page edition of this continuing series on the basic principles of optical lithography. To. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern.   Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. This self-contained text details both elementary and advanced aspects of submicron microlithography - providing a balanced treatment of theoretical and operating practices as well as complete information on current research in the field. Including discussions on electron beam, x-ray, and proximal probe techniques and enhanced with timesaving citations to key sources in the literature and more.